Model - Metrology Calibration/Machine Matching/Intrafield
Operator:ASM    Machine:	 Release:8.9.0    Date:04/28/2026  Time:06:13


   Machine to Machine Matching                       

Exposure Layer        : --- First ---               : --- Second ---
Date/Time             : Wed Aug  9 23:05:57 2000    : Tue Apr 28 05:59:50 2026
Machine ID            :  8317                       :  4690
Reticle ID            : 45440251DUV                 : 45560011P021            
Reference Grid        :                             :       
Matching set ID       : DEFAULT                     : ORIGINAL       
Reticle Alignment     : TTL Align                   : TTL Align 
Wafer Alignment       : TTL Align                   : TTL Align 
Lens Type             : 70                          : 70      
Lens ID               : 0111654a                    : 0115361Z
Energy    [mJ/cm2]    :   18.0                      :   18.0 
Focus Offset  [um]    :   0.00                      :   0.00  
Illumination Mode     : Default                     : Conventional   
Blade ID              :                             :                
Numerical Aperture    : 0.66                        : 0.66    
Sigma Inner           : 0.00                        :         
Sigma Outer           : 0.65                        : 0.65    
Temperature [degC]    : 22.0                        : 22.0  
Pressure    [mbar]    : 992.5                       : 990.3   
Wavelength    [nm]    : 248.305                     : 248.310   

Comments from:
  'Exposure First Layer'   :                                                   
  'Exposure Second Layer'  :                                                   
  'Measure Mark Positions' :                                                   
  'XY-Imaging Modelling'   :                                                   

Test Log Name              : XYM_4690_8317.tlg                                 
Optimization Method        : Least-Squares  
Number of Wafers           :       1
Number of Rejected Wafers  :       0
Number of Fields per Wafer :      12
Number of Marks per Field  :      17
Alignment Errors in Data   :       0
Max Field Size X      [mm] :      26.0
               Y      [mm] :      33.0

Wafer/Field/Mark Selection : *:*:*                                             
Align. Errors in Selection :       0
Overlay Mode               : Second to First     
Set Threshold              : OFF 

Reticle data used   : Reticle data from testlog                         
Reticle layout used : 4X_OV759_28R6_17                                  
                      

   

==============================================================================



 Overlay Error for this Batch:                                                  



+------------------+-----------------------------+
|                  |   Filtered Overlay Error    |
|                  +---------+---------+---------+
|                  |    X    |    Y    | Vector  |
|                  |  [nm]   |  [nm]   |  [nm]   |
+==================+=========+=========+=========+
| Mean             |     4.3 |     2.2 |         |
| St. Dev.         |     9.3 |     7.3 |         |
| |Mean| + 3 Sigma |    32.1 |    24.2 |         |
| Maximum 99.7%    |    25.5 |    20.5 |    25.5 |
+------------------+---------+---------+---------+


                                                                                
 Maximum Overlay Error positions for this Batch:                                



+------+----------+---------+----------+-------------------------------+
|      |          |         |          |Corresponding Position in Field|
|      |          |         |          +---------------+---------------+
|  Nr  |  Max DX  |  Stdev  |    DY    |       X       |       Y       |
|      |   [nm]   |  [nm]   |   [nm]   |     [mm]      |     [mm]      |
+======+==========+=========+==========+===============+===============+
|    1 |     19.1 |     7.8 |      4.8 |     -0.000    |      6.480    |
|    2 |     14.4 |     4.9 |      1.7 |    -10.800    |    -10.800    |
|    3 |     13.0 |     5.7 |      0.7 |     -6.480    |     -0.000    |
|    4 |     11.1 |     5.0 |      5.8 |     -0.000    |     -0.000    |
|    5 |     10.3 |     6.1 |      2.4 |     10.800    |     10.800    |
|    6 |      9.9 |     6.7 |      6.7 |    -10.800    |     -0.000    |
|    7 |      8.1 |     6.1 |      2.7 |     -6.480    |     -6.480    |
|    8 |      7.4 |     7.5 |      2.5 |     -0.000    |    -10.800    |
|    9 |      6.5 |     8.1 |      9.1 |     -0.000    |     -6.480    |
|   10 |      6.3 |     5.8 |      0.5 |     -6.480    |      6.480    |
+------+----------+---------+----------+---------------+---------------+


+------+----------+---------+----------+-------------------------------+
|      |          |         |          |Corresponding Position in Field|
|      |          |         |          +---------------+---------------+
|  Nr  |  Max DY  |  Stdev  |    DX    |       X       |       Y       |
|      |   [nm]   |  [nm]   |   [nm]   |     [mm]      |     [mm]      |
+======+==========+=========+==========+===============+===============+
|    1 |     13.7 |     6.6 |      5.0 |     10.800    |    -10.800    |
|    2 |      9.1 |     4.8 |      6.5 |     -0.000    |     -6.480    |
|    3 |      6.7 |     4.8 |      9.9 |    -10.800    |     -0.000    |
|    4 |      6.3 |     5.2 |      1.9 |      6.480    |     -6.480    |
|    5 |      5.8 |     6.6 |     11.1 |     -0.000    |     -0.000    |
|    6 |      4.8 |     8.5 |     19.1 |     -0.000    |      6.480    |
|    7 |      3.9 |     6.1 |      1.6 |    -10.800    |     10.800    |
|    8 |      3.7 |     8.4 |      0.3 |      6.480    |      6.480    |
|    9 |      2.7 |     4.3 |      8.1 |     -6.480    |     -6.480    |
|   10 |      2.6 |     6.9 |      5.0 |     10.800    |     -0.000    |
+------+----------+---------+----------+---------------+---------------+


 Intrafield Overlay Error Classification:                                       



+------------------------------+---------------------+---------------------+
|                              |  Model Parameters   |Max. Resulting Errors|
|                              +----------+----------+----------+----------+
|                              |   Mean   |Std. Dev. |   Mean   |Std. Dev. |
|                              |          |          |   [nm]   |   [nm]   |
+==============================+==========+==========+==========+==========+
| Translation in X       [um]  |    0.004 |    0.005 |      4.3 |      4.9 |
| Translation in Y       [um]  |    0.002 |    0.006 |      2.2 |      5.5 |
| Rotation             [urad]  |    0.143 |    0.150 |      3.0 |      3.1 |
| Magnification         [ppm]  |   -0.505 |    0.200 |    -10.6 |      4.2 |
| 3rd Order Dist.    [nm/cm3]  |    0.120 |    3.785 |      0.3 |      8.3 |
| Asymm. Rotation      [urad]  |    0.144 |    0.113 |      3.0 |      2.4 |
| Asymm. Magnification  [ppm]  |   -0.173 |    0.241 |     -3.6 |      5.1 |
+------------------------------+----------+----------+----------+----------+


 Interfield Overlay Error Classification:                                       



+------------------------------+---------------------+---------------------+
|                              |  Model Parameters   |Max. Resulting Errors|
|                              +----------+----------+----------+----------+
|                              |   Mean   |Std. Dev. |   Mean   |Std. Dev. |
|                              |          |          |   [nm]   |   [nm]   |
+==============================+==========+==========+==========+==========+
| Translation in X       [um]  |    0.004 |    0.000 |     4.3  |     0.0  |
| Translation in Y       [um]  |    0.002 |    0.000 |     2.2  |     0.0  |
| Wafer Rotation       [urad]  |    0.023 |    0.000 |     2.4  |     0.0  |
| Nonorthogonality     [urad]  |   -0.039 |    0.000 |    -4.0  |     0.0  |
| Scaling in X          [ppm]  |   -0.043 |    0.000 |    -4.4  |     0.0  |
| Scaling in Y          [ppm]  |    0.043 |    0.000 |     4.4  |     0.0  |
| Rotation Scaling  [urad/cm]  |   -0.010 |    0.000 |    -2.2  |     0.0  |
+------------------------------+----------+----------+----------+----------+


 Residuals for this batch:                                                      



+--------------------+---------+
|                    |  Value  |
+====================+=========+
| Residual X [nm]    |     5.7 |
| Residual Y [nm]    |     4.2 |
+--------------------+---------+


 Overlay Error after proposed Corrections are carried out:                      



+------------------+-----------------------------+
|                  |        Overlay Error        |
|                  +---------+---------+---------+
|                  |    X    |    Y    | Vector  |
|                  |  [nm]   |  [nm]   |  [nm]   |
+==================+=========+=========+=========+
| Mean             |     0.0 |    -0.0 |         |
| St. Dev.         |     8.1 |     6.9 |         |
| |Mean| + 3 Sigma |    24.3 |    20.6 |         |
| Maximum 99.7%    |    24.9 |    16.8 |    26.4 |
+------------------+---------+---------+---------+


 Filtered Overlay Error after proposed Corrections are carried out:             



+------------------+-----------------------------+
|                  |   Filtered Overlay Error    |
|                  +---------+---------+---------+
|                  |    X    |    Y    | Vector  |
|                  |  [nm]   |  [nm]   |  [nm]   |
+==================+=========+=========+=========+
| Mean             |     0.0 |    -0.0 |         |
| St. Dev.         |     7.3 |     6.4 |         |
| |Mean| + 3 Sigma |    21.9 |    19.1 |         |
| Maximum 99.7%    |    22.0 |    17.1 |    23.5 |
+------------------+---------+---------+---------+


 THE FOLLOWING CORRECTIONS SHOULD BE APPLIED TO THE MACHINE CONSTANTS:          



+------------------------------------+-------------+-------------+-------------+
|                                    |  Reference  | Correction  |     New     |
+====================================+=============+=============+=============+
| Matching Translation in X     [um] |      -0.042 |       0.004 |      -0.038 |
| Matching Translation in Y     [um] |      -0.032 |       0.002 |      -0.030 |
| Matching Rotation           [urad] |      -0.439 |       0.143 |      -0.296 |
| Matching Magnification       [ppm] |       0.270 |      -0.505 |      -0.235 |
| Matching 3rd Order Dist.  [nm/cm3] |       3.712 |       0.120 |       3.832 |
| Matching Asym. Rotation     [urad] |      -0.338 |       0.144 |      -0.194 |
| Matching Asym. Magnification [ppm] |       0.268 |      -0.173 |       0.095 |
| Reticle Height                [um] |             |             |             |
| Stone to Lens Tilt Rx       [urad] |             |             |             |
| Stone to Lens Tilt Ry       [urad] |             |             |             |
| White Level Sensor Tilt Rx  [urad] |             |             |             |
| White Level Sensor Tilt Ry  [urad] |             |             |             |
| Level Sensor Height           [um] |             |             |             |
| Rotation Scaling         [urad/cm] |             |             |             |
| Wafer Rotation              [urad] |             |             |             |
| Nonorthogonality            [urad] |             |             |             |
| Scaling in X                 [ppm] |             |             |             |
| Scaling in Y                 [ppm] |             |             |             |
+------------------------------------+-------------+-------------+-------------+